Illumination field parameters measurement for lithographic illumination subsystem

Liu, ZF; Chen, M; Bu, Y; Xu, JH; Fan, LL; Zhang, JH; Wang, XZ

Bu, Y (corresponding author), Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China.

OPTIK, 2020; 206 ():

Abstract

To measure the knife-edge penumbra optical parameters in ArF lithography illumination subsystem accurately, a technique based on the pupil image is pr......

Full Text Link


Links

期刊讨论 | 中国SCI论文 | 期刊主页 | 投稿经验 | 杂志官网 | 投稿链接 | 作者需知 | PMC链接 | Pubmed全文检索