Model Transferability from ImageNet to Lithography Hotspot Detection

Xiao, YD; Huang, XQ; Liu, K

Liu, K (corresponding author), Univ Elect Sci & Technol China, Sch Automat Engn, Chengdu, Peoples R China.

JOURNAL OF ELECTRONIC TESTING-THEORY AND APPLICATIONS, ; ():

Abstract

Detecting lithographic hotspots is significant for VLSI fabrication before transferring the designed circuit layout pattern to silicon. However, the c......

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