SAQP Pitch walk metrology using single target metrology

Fang, F; Herrera, P; Kagalwala, T; Camp, J; Vaid, A; Pandev, S; Zach, F

Fang, F (reprint author), GLOBALFOUNDRIES, 400 Stonebreak Rd Extens, Malta, NY 12020 USA.

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI, 2017; 10145 ( ):

Abstract

Self-aligned quadruple patterning (SAQP) processes have found widespread acceptance in advanced technology nodes to drive device scaling beyond the re......

Full Text Link