Si-Based Materials for Thermoelectric Applications

Tanusilp, SA; Kurosaki, K

Tanusilp, SA; Kurosaki, K (reprint author), Osaka Univ, Grad Sch Engn, 2-1 Yamadaoka, Suita, Osaka 5650871, Japan.; Kurosaki, K (reprint author), Kyoto Univ, Inst Integrated Radiat & Nucl Sci, 2 Asashiro Nishi, Kumatori, Osaka 5900494, Japan.; Kurosaki, K

MATERIALS, 2019; 12 (12):

Abstract

Si-based thermoelectric materials have attracted attention in recent decades with their advantages of low toxicity, low production costs, and high sta......

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