Study on High Reflective Film in 121.6 nm Far Ultraviolet

Wang, JY; Zhang, JL; Jiao, HF; Cheng, XB

Zhang, JL (corresponding author), Tongji Univ, Sch Phys Sci & Engn, Inst Precis Opt Engn, Shanghai 200092, Peoples R China.; Zhang, JL (corresponding author), Tongji Univ, MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China.

ACTA OPTICA SINICA, 2020; 40 (9):

Abstract

There arc important practical applications of high reflective films in the far-ultraviolet band. In order to obtain high reflectance, the far-ultravio......

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