Machine Learning Guided Curvilinear MPC

Sharma, M; Durvasula, B; Rao, N; Bork, I; Sharma, R; Mishra, K; Buck, P

Sharma, M (reprint author), Mentor Graph India Pvt Ltd, Nalapad Brigade Ctr, Unit 301, Bangalore 560048, Karnataka, India.

PHOTOMASK TECHNOLOGY 2019, 2019; 11148 ():

Abstract

With the advancement of semiconductor technology beyond 7nm, the speed and accuracy constraints on computational lithography are tightening. As the ma......

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