Inline PECVD Deposition of Poly-Si-Based Tunnel Oxide Passivating Contacts

Temmler, J; Polzin, JI; Feldmann, F; Kraus, L; Kafle, B; Mack, S; Moldovan, A; Hermle, M; Rentsch, J

Temmler, J (reprint author), Fraunhofer Inst Solar Energy Syst ISE, Heidenhofstr 2, D-79110 Freiburg, Germany.

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2018; 215 (23):

Abstract

In this publication, the deposition of a-Si(n) layers using an industrially relevant inline plasma-enhanced chemical vapor deposition (PECVD) tool for......

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