Contact resistance at graphene/MoS2 lateral heterostructures

Houssa, M; Iordanidou, K; Dabral, A; Lu, A; Meng, R; Pourtois, G; Afanas'ev, VV; Stesmans, A

Houssa, M (reprint author), Univ Leuven, Dept Phys & Astron, B-3001 Leuven, Belgium.

APPLIED PHYSICS LETTERS, 2019; 114 (16):