Achieving a high dielectric tunability in strain-engineered tetragonal K0.5Na0.5NbO3 films
Hao, LX; Yang, YL; Huan, Y; Cheng, HB; Zhao, YY; Wang, YY; Yan, J; Ren, W; Jun, O
Jun, O (corresponding author), Qilu Univ Technol, Shandong Acad Sci, Sch Chem & Chem Engn, Inst Adv Energy Mat & Chem,Shandong Prov Key Lab, Jinan, Peoples R China.; Yang, YL (corresponding author), Shanghai Univ, Int Ctr Quantum & Mol Struct, Dept Phys, Shanghai, Peoples R China.; Huan, Y (corresponding author), Univ Jinan, Sch Mat Sci & Engn, Jinan, Peoples R China.
NPJ COMPUTATIONAL MATERIALS, 2021; 7 (1):