Highly Scaled Ruthenium Interconnects

Dutta, S; Kundu, S; Gupta, A; Jamieson, G; Granados, JFG; Bommels, J; Wilson, CJ; Tokei, Z; Adelmann, C

Dutta, S (reprint author), IMEC, B-3001 Leuven, Belgium.

IEEE ELECTRON DEVICE LETTERS, 2017; 38 (7): 949

Abstract

Ruthenium has emerged as a promising candidate to substitute Cu as the interconnect metallization in future technology nodes. Here, we demonstrate are......

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