The Effect of Deposition Temperature of TiN Thin Film Deposition Using Thermal Atomic Layer Deposition

Lee, BJ; Kim, YS; Seo, DW; Choi, JW

Lee, BJ (通讯作者)，Hanwha Corp, Vacuum Equipment R&D Div, Semicond Res Ctr, Pangyo Ro 305, Seongnam 13488, South Korea.

COATINGS, 2023; 13 (1):

Abstract

In this study, the effect of deposition temperature of TiN thin films deposited using the thermal atomic layer deposition (ALD) method was investigate......

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