Effect of Ar partial pressure and substrate temperature of CaLa4(Zr0.05Ti0.95)(4)O-15 dielectric films-MedSci.cn

Effect of Ar partial pressure and substrate temperature of CaLa4(Zr0.05Ti0.95)(4)O-15 dielectric films

Hsu, CH; Chen, WS; Tseng, CF; Lin, JS; Chou, PH; Lin, YJ

Hsu, CH (通讯作者)，Natl United Univ, Dept Elect Engn, 2 Lien Da, Miaoli 36063, Taiwan.

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2022; 28 (1): 77

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