In-Cell Overlay Metrology by Using Optical Metrology Tool

Lee, H; Han, S; Hong, M; Kim, S; Lee, J; Lee, D; Oh, E; Choi, A; Park, H; Liang, W; Choi, D; Kim, N; Lee, J; Pandev, S; Jeon, S; Robinson, JC

Lee, H (reprint author), SK Hynix, 2091 Gyeongchung Daero, Icheon Si 467701, Gyeonggi Do, South Korea.

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXII, 2018; 10585 ():

Abstract

Overlay is one of the most critical process control steps of semiconductor manufacturing technology. A typical advanced scheme includes an overlay fee......

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