Spirothiopyran-Based Reversibly Saturable Photoresist

Vijayamohanan, H; Palermo, EF; Ullal, CK

Ullal, CK (reprint author), Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA.

CHEMISTRY OF MATERIALS, 2017; 29 (11): 4754

Abstract

Super-resolution lithography holds the promise of achieving three-dimensional (3D) nanopatterning at deep subwave-length resolutions with high through......

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