Sidewall doping mechanism and doping profile tuning on 3D structure by plasma doping

Wang, CY; England, J; Gossmann, H; Persing, H; Miller, T; Gao, Q; Tang, S; Salimian, S

Wang, CY (reprint author), Appl Mat Inc, Silicon Syst Grp, Varian Semicond Business Unit, 35 Dory Rd, Gloucester, MA 01930 USA.

2017 17TH INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY (IWJT), 2017; ( ): 58

Abstract

In this paper the primary mechanisms for the plasma doping (PLAD) of 3D structures - direct implant, scattered implant, deposition & knock-in, and......

Full Text Link


Links

期刊讨论 | 中国SCI论文 | 期刊主页 | 投稿经验 | 杂志官网 | 投稿链接 | 作者需知 | PMC链接 | Pubmed全文检索