Hard-Baked Photoresist as a Sacrificial Layer for Sub-180 degrees C Surface Micromachining Processes

Tawfik, HH; Elsayed, MY; Nabki, F; El-Gamal, MN

Tawfik, HH (reprint author), McGill Univ, Dept Elect & Comp Engn, Montreal, PQ H3A 0E9, Canada.

MICROMACHINES, 2018; 9 (5):

Abstract

This letter proposes a method for utilizing a positive photoresist, Shipley 1805, as a sacrificial layer for sub-180 degrees C fabrication process flo......

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