Plasmon-assisted optical critical dimension measurement for three-layer orthogonal metallic gratings

Yu, AQ; Zhao, XL; Ni, S; Dai, R; Miao, JS; Guo, XG

Zhao, XL (corresponding author), Nova Measuring Instruments, Xin Jinqiao Rd 58, Shanghai, Peoples R China.

PHOTONICS AND NANOSTRUCTURES-FUNDAMENTALS AND APPLICATIONS, 2021; 46 ():

Abstract

In this work, a 3-layer cross copper grating structure, which is the basic structure in semiconductor processing technology, is simulated by the rigor......

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