Effect of plasma-assisted N2O/Ar oxidation on TOPCon solar cells

Huang, JB; Zhao, ZC; Li, M; Chen, J; Zhou, XR; Deng, XX; Li, B; Shen, KL; Cheng, QY; Cai, XW

Zhao, ZC (通讯作者)，Hunan Red Solar Photoelect Sci & Technol Co Ltd, Natl Engn Res Ctr Photovolta Equipment NCPVE, Changsha 410000, Peoples R China.

SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2023; 260 ():

Abstract

N2O/Ar gas mixture are used to deposit ultra-thin silicon oxide (SiOx) layer by plasma enhanced chemical vapor deposition (PECVD), which is used as th......

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