Novel Spin on Planarization Technology by Photo Curing SOC (P-SOC)

Endo, T; Sakamoto, R; Hashimoto, K; Saito, D; Nishimaki, H; Karasawa, R; Tokunaga, H

Endo, T (reprint author), Nissan Chem Ind, Semicond Mat Res Dept, Mat Res Labs, 635 Sasakura, Fuchu, Toyama 9392792, Japan.

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIV, 2017; 10146 ( ):

Abstract

In advanced lithography technology, high planarity SOC (Spin-on-Carbon) materials which can planarize topography substrates are required in order to o......

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