Plasmon-assisted nanojet lithography

Wang, SS; Ding, T

Ding, T (reprint author), Wuhan Univ, Sch Phys & Technol, Key Lab Artificial Micro & Nanostruct, Minist Educ China, Wuhan 430072, Hubei, Peoples R China.

NANOSCALE, 2019; 11 (19): 9593

Abstract

The great barrier of optical diffraction significantly limits the resolution of photolithography and the manipulation of nano-objects by light. Here, ......

Full Text Link