Enhancement of Diffraction-Based Overlay Model for Overlay Target With Asymmetric Sidewall

Su, CH; Lin, ZH; Lin, YS; Kuo, HF

Kuo, HF (corresponding author), Natl Taiwan Univ Sci & Technol, Grad Inst Automat & Control, Taipei 106, Taiwan.

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2020; 33 (3): 373

Abstract

Overlay metrology is crucial to process control in manufacturing semiconductor devices. Diffraction-based overlay (DBO) is an effective overlay measur......

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