Healing Ion-Implanted Semiconductors by Hybrid Microwave Annealing: Activation of Nitrogen-Implanted TiO2

Zhang, HM; Ahn, CW; Park, JY; Ok, JW; Sung, JY; Jin, JS; Kim, HG; Lee, JS

Kim, HG (通讯作者),Korea Basic Sci Inst, Busan Ctr, Busan 609735, South Korea.;Zhang, HM (通讯作者),Sichuan Univ, Engn Res Ctr Alternat Energy Mat & Devices, Minist Educ, Coll Mat Sci & Engn, Chengdu 610065, Peoples R China.;Lee, JS (通讯作者),Ulsan Natl Inst Sci & Technol, Sch Energy & Chem Engn, Ulsan 44919, South Korea.

JOURNAL OF PHYSICAL CHEMISTRY LETTERS, 2022; 13 (17): 3878