Improved Hemicellulose Spin On Carbon Hardmask

Morita, K; Yamamoto, K; Tanaka, H; Tanaka, Y; Harumoto, M; Tanaka, Y; Nakayama, C; Arisawa, Y; Motono, T; Stokes, H; Asai, M; Pieczulewski, C

Morita, K (reprint author), Oji Holdings Corp, Koto Ku, 1-10-6 Shinonome, Tokyo 1358558, Japan.

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXVI, 2019; 10960 ():

Abstract

Regarding 3D semiconductor devices, one of difficulties is hardmask process for deep memory holes because of expensive process cost. To overcome this ......

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