Study of Modified Offset Trajectory for Bonnet Polishing Based on Lifting Bonnet Method

Sha, SJ; Ma, SH; Han, SQ; Pan, CH; Li, H; Lin, JQ; Zhang, MX; Jiang, LL

Sha, SJ; Lin, JQ (通讯作者)，Changchun Univ Technol, Sch Mechatron Engn, Changchun 130012, Peoples R China.;Sha, SJ; Lin, JQ (通讯作者)，Changchun Univ Technol, Sch Mechatron Engn, Key Lab Micronano & Ultraprecis Mfg Jilin Prov, Changchun 130012, Peoples R China.

MICROMACHINES, 2023; 14 (12):

Abstract

The inability to converge at the edge of a workpiece during polishing affects the edge profile accuracy and surface quality of the workpiece. In this ......

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