Improved multi-lot overlay performance via phase-based ADI overlay measurements

Lee, D; Lee, J; Lee, E; Lee, J; Lee, SY; Hwang, C; Kapel, P; Yang, SB; Baek, MY; Bettink, JW; Jeon, SR; Kim, T; Soco, A; Zwier, O; van Witteveen, K

Lee, D (通讯作者),Samsung Elect Co Ltd, Suwon, South Korea.

METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVI, 2022; 12053 ():