Mask Assignment and DSA Grouping for DSA-MP Hybrid Lithography for Sub-7 nm Contact/Via Holes

Badr, Y; Torres, A; Gupta, P

Badr, Y (reprint author), Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA.

IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, 2017; 36 (6): 913

Abstract

Directed self assembly (DSA) is a very promising candidate for the sub-7 nm technology nodes. To print such small dimensions, multiple patterning (MP)......

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