SEM based overlay measurement between Via patterns and buried M1 patterns using high voltage SEM

Hasumi, K; Inoue, O; Okagawa, Y; Shao, CY; Leray, P; Halder, S; Lorusso, G; Jehoul, C

Hasumi, K (reprint author), Hitachi High Technol, Tokyo, Japan.

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI, 2017; 10145 ( ):

Abstract

The miniaturization of semiconductors continues, importance of overlay measurement is increasing. We measured overlay with analysis SEM called Miracle......

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