Reactant utilization in CVD and ALD chambers

McInerney, EJ

McInerney, EJ (reprint author), Lam Res Corp, 4650 Cushing Pkwy, Fremont, CA 94538 USA.

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2017; 35 (1):

Abstract

In both chemical vapor deposition (CVD) and atomic layer deposition (ALD) reactors, a substantial fraction of the reactants never react at the substra......

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